Effect of Different Oxidation Temperature on Nano and Micro TCO’s Thin Film


In the present work, electrical structural and surface morphology of tin oxide thin films prepared using simple conventional method known as (CTO) was carried out. The obtained result insures the formation of Nano crystalline SnO2 films as a tetragonal structure. The atomic force microscope results show that film roughness depended on oxidation temperature. Minimum electrical resistivity found to be about (5.35 x 10-5 .cm) at (300°C) oxidation temperature.