Morphological and Optical Properties of Cuo/Sapphire Thin Films Prepared by Pulsed Laser Deposition


This paper addresses the structure, morphological and optical properties of copper oxide (CuO) thin film deposited by pulsed laser deposition (PLD) method on Sapphire substrate of 150nm thickness. The film deposited at substrate temperature (400ºC). The atomic force microscopy (AFM), Fourier transform infrared spectroscopy (FTIR) and UV-VIS transmission spectroscopy were employed to characterize the size, morphology, crystalline structure and optical properties of the prepared thin film. The surface properties were characterized using (AFM), indicate that the average grain size less than 100nm, the surface roughness (2.69nm) and the root mean square is (3.58nm). The FTIR spectra shown strong band at about 418 cm-1and 530 cm-1 related to CuO. From the UV-VIS transmission the energy band gap (1.7eV).