Study of Structural Morphology and Optical Properties of Nickel Doped Nanostructured Tin Oxide Thin Films

Abstract

The article describes a method that was used to prepare thin films of Undoped SnO2 and SnO2:Ni thin films via a simple, costless, and suitable technique to prepare thin films with acceptable homogeneity using chemical spray pyrolysis (CSP) method. XRD anaylsis assures that Undoped SnO2 and SnO2:Ni films are polycrystalline with recognized peak at (110)., Nickel content were changed from (0 , 2, 4) % cause increasing the crystallite size from 12.76 nm to the Undoped SnO2 and 14.08 nm for the SnO2: 4%Ni. while the dislocation density and strain are decreasing from (6.14-5.04) nm, (2.71 – 2.46) nm respectively. Furthermore average diameter decreased from 75.09 nm to 60.78 nm with an increase of Nickel content. Rrms value of 6.78 nm for Undoped SnO2 thin films decreased to 3.16 nm by ni content increase to 4%. The transmittance decreased slightly with increasing of Nickel content, while absorption coefficient is increased with the increasing of Nickel content in SnO2 films, energy gap decreased from 3.68 eV for SnO2 film to 3.58 eV for the doping SnO2: 4% Ni film. refractive index and extinction coefficient are decreased with the increase Nickel content