Effect of Substrate Temperature on the Structural and Morphological Properties of Nano-structure ZnO films by Pulsed Laser Deposition


In this work, ZnO thin films were grown on sapphire (0001) substrate byPulsed Laser Deposition using SHG with Q-switched Nd:YAG pulsed laser operationat 532nm in O2 gas ambient 5×10-2 mbar at different substrate temperatures varyingfrom room temperature to 500°C. The influence of the substrate temperature on thestructural and morphological properties of the films were investigated using XRD andSEM. As result, at substrate 400°C, a good quality and crystalline films were depositedthat exhibits an average grain size (XRD) of 22.42nm with an average grain size(SEM) of 21.31nm.