Model Calculation for Ion Implantation


In this paper, the diffusion of gas atoms that injected by ion implantation intoa layer of certain thickness is studied and investigated by using the equation for thelocal gas atom concentration. The ion implantation in to multilayer membrane will beinvestigated and parameterized, with various situations will be discussed.Notablly, we assume that the implanted ion flux up on the surface dose not sputter thetarget atomes or in other words the coefficient of sputtering is small which means thatthe incident ions are light