Study the Drift Velocity of Electron in Mixtures CF4, O2 and Ar

Abstract

We have calculated the electron drift velocity in pure CF4 and their mixtures with Ar and O2 (10%-80%-10%)for ratios of the electric field to the gas number density E/N from 1 Td to 1000 Td (1 Td = 10 -17 Vcm2),This is mixture is usual used in plasma etching application .The results obtained by using a simple two term solutions for Boltzmann’s equation, We found good agreement between calculated and measured values for electron drift velocity in pure CF4 and their mixtures, These results are useful for determining the electron drift velocity which is an important swarm parameter used to characterize the conductivity of a weakly ionized gas.