@Article{, title={High-Quality Plasma- Induced Crystallization of Amorphous Silicon Structures}, author={A.M. Aldhafiri}, journal={Iraqi Journal of Applied Physics المجلة العراقية للفيزياء التطبيقية}, volume={5}, number={1}, pages={35-39}, year={2009}, abstract={The investigation of polycrystalline silicon made on glass and carboncoated nickel substrates by aluminum-induced crystallization ofamorphous silicon (a-Si) is reported. Aluminum was sputtered onto a-Si films deposited in an ultra-high-vacuum plasma-enhanced chemicalvapor deposition (PECVD) system to form Al/a-Si substrate structures.These samples were then vacuum annealed for 30min. at temperaturesin the range 150-350°C. X-ray diffractometry (XRD) was utilized todetermine the crystallization temperature. Annealing at 275°C resultedin the formation of crystalline Si as observed by XRD. The presence ofthese hillocks or bumps after annealing at 275°C and above confirmsthat the a-Si has been crystallized.

} }