Iraqi Academic Scientific Journals

Preparation of Highly Pure Nanostructures by Reactive DC Magnetron Sputtering Technique

Firas J. Kadhim, Oday A. Hammadi, Mohammed K. Khalaf, Bahaa T. Chiad

Iraqi Journal of Applied Physics, 2016, Volume 12, Issue 3, Pages 27-34

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Preparation and Characterization of Silicon Dioxide Nanostructures by DC Reactive Closed-Field Unbalanced Magnetron Sputtering

Mohammed A. Hameed, Zahraa M. Jabbar

Iraqi Journal of Applied Physics, 2016, Volume 12, Issue 4, Pages 13-18

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Structural Characteristics of Nickel Ferrite Nanoparticles Synthesized by New Arrangement of Concentric Targets in DC Reactive Magnetron Sputtering

Firas J. Kadhim, Ruaa A. Mohammed

Iraqi Journal of Applied Physics, 2016, Volume 12, Issue 4, Pages 9-12

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Spectroscopic study for plasma parameters in co-sputtering system

Kadhim A. Aadim, Rabah A. H. Edan

Iraqi Journal of Physics, 2016, Volume 14, Issue 31, Pages 122-128

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Microhardness of Nanostructured SixN1-x Thin Films Prepared by Reactive Magnetron Sputtering

Ahmed A. Anber, Firas Kadhim

Iraqi Journal of Applied Physics, 2016, Volume 12, Issue 2, Pages 15-19

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Photovoltaic Properties of CdS/Si Heterojunction Prepared by DC Plasma Sputtering Technique

Azhar K. Sadkhan, Sabah Habeeb Sabeeh, Mohammed K. Khalaf

Engineering and Technology Journal, 2016, Volume 34, Issue 2 Part (B) Scientific, Pages 311-316

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Enhanced hydrogen gas sensitivity employing sputtered deposited NiO thin films

Afaf F.Sultan

Iraqi Journal of Physics, 2016, Volume 14, Issue 30, Pages 150-157

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Current-Voltage Characteristics of DC Plasma Discharges Employed in Sputtering Techniques

Mohammed K. Khalaf, Oday A. Hammadi, Firas J. Kadhim

Iraqi Journal of Applied Physics, 2016, Volume 12, Issue 3, Pages 11-16

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Langmuir Probe Diagnostics of Low-Pressure Glow Discharge Plasma Using Argon-Nitrogen Mixtures

Bahaa T. Chiad, Oday A. Hammadi, Firas J. Kadhim, Mohammed K. Khalaf

Iraqi Journal of Applied Physics, 2016, Volume 12, Issue 3, Pages 17-26

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Employment of Magnetron to Enhance Langmuir Probe Characteristics of Argon Glow Discharge Plasma in Sputtering System

Oday A. Hammadi, Waleed N. Raja, Mohammed A. Saleh, Wisam A. Altun

Iraqi Journal of Applied Physics, 2016, Volume 12, Issue 4, Pages 19-28

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Found: 18 resources

Preparation of Highly Pure Nanostructures by Reactive DC Magnetron Sputtering Technique

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Preparation and Characterization of Silicon Dioxide Nanostructures by DC Reactive Closed-Field Unbalanced Magnetron Sputtering

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Structural Characteristics of Nickel Ferrite Nanoparticles Synthesized by New Arrangement of Concentric Targets in DC Reactive Magnetron Sputtering

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Spectroscopic study for plasma parameters in co-sputtering system

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Microhardness of Nanostructured SixN1-x Thin Films Prepared by Reactive Magnetron Sputtering

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Photovoltaic Properties of CdS/Si Heterojunction Prepared by DC Plasma Sputtering Technique

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Enhanced hydrogen gas sensitivity employing sputtered deposited NiO thin films

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Current-Voltage Characteristics of DC Plasma Discharges Employed in Sputtering Techniques

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Langmuir Probe Diagnostics of Low-Pressure Glow Discharge Plasma Using Argon-Nitrogen Mixtures

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Employment of Magnetron to Enhance Langmuir Probe Characteristics of Argon Glow Discharge Plasma in Sputtering System

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