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Anisotropic etching of poly-silicon wafer by using CF3Br plasma

Diyala Journal For Pure Science, 2010, Volume 6, Issue 1, Pages 368-374

Studying Properties of SF6 Plasma

Journal of Research Diyala humanity, 2009, Volume , Issue 37, Pages 61-72
 

Using Wet&Dry El油山g techndogies to etch SioWaFers

Journal of College of Education, 2010, Volume , Issue 5, Pages 86-97
 

Statistical Analysis study different between wet and dry etching

Diyala Journal For Pure Science, 2014, Volume 10, Issue 1, Pages 60-64
 

Etch of Si-wafer using CF3Br plasma and KOH solution

Diyala Journal For Pure Science, 2012, Volume 8, Issue 3 - part 2, Pages 400-406
 
 

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