Iraqi Academic Scientific Journals

Investigation of plasma characteristics of center region of postcylindrical magnetron sputtering device

Qusay A. Abbas, Rahman R .Abdula, Baha T. Chied

Iraqi Journal of Physics, 2010, Volume 8, Issue 11, Pages 33-40

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The effect of anode temperature on the Optical characteristic of Se films prepared by direct current planar magnetron sputtering

Kadhim A.A.Al-Hamdani, R.M.S.Al-Haddad, Ali A-K.Hussain

Iraqi Journal of Physics, 2010, Volume 8, Issue 13, Pages 28-32

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Nanostructured Copper Oxide Thin Films Prepared by DC Reactive Magnetron Sputtering

Mohammed A.K. Ahmed

Iraqi Journal of Applied Physics, 2017, Volume 13, Issue 2, Pages 11-14

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Heterojunction Solar Cell Based on Highly-Pure Nanopowders Prepared by DC Reactive Magnetron Sputtering

Saja H. Faisal

Iraqi Journal of Applied Physics, 2020, Volume 16, Issue 3, Pages 27-32

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Current–voltage and capacitance-voltage characteristics of Se/Si heterojunction prepared by DC planar magnetron sputtering technique

R.M.S.Al-Haddad, Ali A-K.Hussain, Kadhim A.A.Al-Hamdani

Iraqi Journal of Physics, 2010, Volume 8, Issue 13, Pages 97-100

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The axial profile of plasma characteristics of cylindrical magnetron sputtering device

Baha T. Chied, Rahman R. Abdula, Qusay A. Abbas

Iraqi Journal of Physics, 2010, Volume 8, Issue 11, Pages 41-47

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Double probe for measuring the plasma parameters

Raad M.S.Al-Haddad, Ali A – K. Hussain, Emad A. Salman

Iraqi Journal of Physics, 2012, Volume 10, Issue 18, Pages 11-16

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Structural Properties of Semiconducting Nanostructures Prepared by DC Plasma Reactive Sputtering Method

Noor I. Naji

Iraqi Journal of Applied Physics, 2014, Volume 10, Issue 3, Pages 41-44

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Microhardness of Nanostructured SixN1-x Thin Films Prepared by Reactive Magnetron Sputtering

Ahmed A. Anber, Firas Kadhim

Iraqi Journal of Applied Physics, 2016, Volume 12, Issue 2, Pages 15-19

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Current-Voltage Characteristics of DC Plasma Discharges Employed in Sputtering Techniques

Mohammed K. Khalaf, Oday A. Hammadi, Firas J. Kadhim

Iraqi Journal of Applied Physics, 2016, Volume 12, Issue 3, Pages 11-16

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Found: 69 resources

Investigation of plasma characteristics of center region of postcylindrical magnetron sputtering device

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The effect of anode temperature on the Optical characteristic of Se films prepared by direct current planar magnetron sputtering

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Nanostructured Copper Oxide Thin Films Prepared by DC Reactive Magnetron Sputtering

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Heterojunction Solar Cell Based on Highly-Pure Nanopowders Prepared by DC Reactive Magnetron Sputtering

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Current–voltage and capacitance-voltage characteristics of Se/Si heterojunction prepared by DC planar magnetron sputtering technique

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The axial profile of plasma characteristics of cylindrical magnetron sputtering device

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Double probe for measuring the plasma parameters

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Structural Properties of Semiconducting Nanostructures Prepared by DC Plasma Reactive Sputtering Method

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Microhardness of Nanostructured SixN1-x Thin Films Prepared by Reactive Magnetron Sputtering

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Current-Voltage Characteristics of DC Plasma Discharges Employed in Sputtering Techniques

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