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The Growth Characteristics of RF-Magnetron Sputtered Nanocrystalline TiO2 Thin Films

Azhar K. Sadkhan --- Suaad A. Mohammed --- Mohammed K. Khalaf

Engineering and Technology Journal مجلة الهندسة والتكنولوجيا
ISSN: 16816900 24120758 Year: 2018 Volume: 36 Issue: 2 Part (B) Engineering Pages: 128-130
Publisher: University of Technology الجامعة التكنولوجية

Abstract

In this paper, RF Magnetron sputtered TiO2 thin films deposited onglass slices at various powers (75,100,125 and 150) Watt for (1.5) hour anddifferent thickness (62.5-88-118 and 132.6) nm, the TiO2 thin films annealed with400°C for 2 hour and the morphology and structure of these films are describedby X-ray diffraction XRD and atomic force microscopy AFM to show the phasestructure. X-ray diffraction investigation uncovered that the crystalline size of theTiO2 thin films displays an expanding pattern with increasing the sputteringpower. The preferred orientation of (101) was watched for the films depositedwith sputtering power of (75,100,125 and 150) Watt

Keywords

Titanium dioxide --- Thin films --- RF sputtering.