Effect of Oxidation Temperature on Opdcal Properties of ln203 Thin Films

Abstract

ln203 thin fllms have been prepared by thellllal evaporation ofindiumin vacuum on unheated glass substrates,followed by thellllal oxidationin air.The effects of oxidation temperature on the thin fllms ln203thickness and optical properties of the fllins were reported.Theabsorption and translnition spectra were recorded in the range 350-900nnl,The direct and a1lowed optical band gap energy has been evaluatedfrOm(αhu)2 vs.(hu)plotS.