Optical Method to Determine the Orientation of Monocrystalline Silicon Wafers


In this work, an optical method was used for the determination of thecrystalline orientation of the chemically etched silicon surfaces in the (111),(110) and (100) planes. This method depends on the light patterns of laserbeam reflected from the monocrystalline surfaces. The optical method submitsacceptable measuring accuracy and well-distinguished folded patterns.