Study of Some Properties of SnO2 Thin Film


In this paper thin films of Tin oxide SnO2 was prepared by spray pyrolyess methodon glass and pure silicon substrates at deposition temperature(300,400,500) Cᵒ, from Tinchloride at concentration(0.1 M) .The films thickness were about 0.1 ±0.02 μm and Atomization rate was about(1 nm/s).The test was done on prepared film by XRD and optical microscopy addition tosensitivity to nitrous oxide gas at different test temperature (25, 50, 75,100) Cᵒ.Result shows that the crystallization increased by increasing deposing temperatureand the sensitivity increased by rising the gas concentration or temperature.