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Influence of Deposition Parameters on Optical and Electrical Properties of CuxS Thin Films Prepared Using Chemical Bath Deposition Method

Authors: A.M. Mousa --- S.H. Nasher --- J.-P. Ponpon
Journal: Iraqi Journal of Applied Physics المجلة العراقية للفيزياء التطبيقية ISSN: 18132065 23091673 Year: 2008 Volume: 4 Issue: 3 Pages: 19-24
Publisher: iraqi society for alternative and renewable energy sources and techniques الجمعية العراقية لمصادر وتقنيات الطاقة البديلة والمستجدة

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Abstract

Thin films of CuxS have been deposited in an aqueous solution of copper chloride, tri ethanol amine, aqueous ammonia and thiourea. The effect of deposition time, solution pH and thiourea amount on films thickness, growth rate, optical and electrical properties has been studied. The film thickness increases with increasing deposition time and thiourea volume, whereas it decreases with increasing the solution pH. The corresponding small modifications of optical properties can be explained by the increase in roughness with film thickness. Electrical resistivity is strongly influenced by the solution pH and by the thiourea amount but depends to a much less extent on the film thickness.

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