research centers


Search results: Found 4

Listing 1 - 4 of 4
Sort by

Article
Optical Characterizations of RF-Magnetron Sputtered Nanocrystalline TiO2 Thin Film

Author: Azhar K. Sadkhan
Journal: Engineering and Technology Journal مجلة الهندسة والتكنولوجيا ISSN: 16816900 24120758 Year: 2018 Volume: 36 Issue: 2 Part (B) Engineering Pages: 156-159
Publisher: University of Technology الجامعة التكنولوجية

Loading...
Loading...
Abstract

TiO2 nanocrystalline thin films are widely used as antireflection coatingin solar cell, in this paper, RF magnetron sputtering technique is used to prepareTiO2 thin film on glass substrates, TiO2 thin films deposited under differentpowers (75,100,125 and 150) Watt for (1.5) hour resulted in different layerthickness (62.5,88,118 and 132.6) nm respectively. The optical propertiesexamined by UV-VIS spectroscopy. TiO2 thin films exhibit a high transparency inthe region from about 350 nm above, we suggest that these results indicate themost suitable growing conditions for obtaining high quality sputtered TiO2 thinfilms with higher transparence performance for solar cell application. the opticalabsorbance coefficient for all films were genuinely high esteems coming to above104cm-1, which implies that there is allowed direct transitions, the energy gabreach to the typical value of the bulk TiO2 (3.5) eV


Article
The Effects of Sputtering Time on Cds Thin Film Solar Cell Deposited by DC Plasma Sputtering Method

Authors: Azhar K. Sadkhan --- Mohammed K. Khalaf
Journal: Engineering and Technology Journal مجلة الهندسة والتكنولوجيا ISSN: 16816900 24120758 Year: 2018 Volume: 36 Issue: 2 Part (C) Pages: 123-127
Publisher: University of Technology الجامعة التكنولوجية

Loading...
Loading...
Abstract

CdS thin films of different thickness have been prepared by dcsputtering technique on glass slides for a window layer of solar cells. The CdStarget were sputtered in different sputtering times (1,1.5,2.5,3) hrs, workingpressure (2×10-2) mbar and discharge voltage(2) kV.The structure of thenanoparticles films was investigated of CdS thin films by X-ray diffraction(XRD).The XRD patterns showed that the films were hexagonal (wurtzite)structure having strong preferential orientation along the (002) plane withparticle size in the range of (41.04-41.46-41.88-42.53) nm, the peak at (002)preferred orientations of the films are shifted a little from left to right side andfilms converted to crystalline form. The morphology of the nanoparticles filmswas studied by atomic force microscopy (AFM) which indicates that theaverage grain size of CdS thin film is in the range of (41.3-44.2-51.6-50.08) nm.The roughness of films surface increases with increasing the sputtering time,which can be useful for the solar cell.


Article
Photovoltaic Properties of CdS/Si Heterojunction Prepared by DC Plasma Sputtering Technique

Authors: Mohammed K. Khalaf --- Sabah Habeeb Sabeeh --- Azhar K. Sadkhan
Journal: Engineering and Technology Journal مجلة الهندسة والتكنولوجيا ISSN: 16816900 24120758 Year: 2016 Volume: 34 Issue: 2 Part (B) Scientific Pages: 311-316
Publisher: University of Technology الجامعة التكنولوجية

Loading...
Loading...
Abstract

CdS/Si heterojunction has been fabricated by dc plasma sputtering technique. Polycrystalline CdS films have been prepared by dc plasma sputtering technique on Si substrate. The current – voltage under illumination showed that the photocurrent increases with increasing incident illumination intensity for CdS/Si heterojunction. The CdS thin films have been sputtered under vacuum of (9×10-2 ,8×10-2, 6×10-2,5×10-2) mbar, theheterojunction has better photovoltaic properties. The open circuit voltage (Voc) and the short circuit current (Isc)were found to vary with working discharge pressure, and the efficiency is 6.72% at 50.3 mW/cm2.


Article
The Growth Characteristics of RF-Magnetron Sputtered Nanocrystalline TiO2 Thin Films

Authors: Azhar K. Sadkhan --- Suaad A. Mohammed --- Mohammed K. Khalaf
Journal: Engineering and Technology Journal مجلة الهندسة والتكنولوجيا ISSN: 16816900 24120758 Year: 2018 Volume: 36 Issue: 2 Part (B) Engineering Pages: 128-130
Publisher: University of Technology الجامعة التكنولوجية

Loading...
Loading...
Abstract

In this paper, RF Magnetron sputtered TiO2 thin films deposited onglass slices at various powers (75,100,125 and 150) Watt for (1.5) hour anddifferent thickness (62.5-88-118 and 132.6) nm, the TiO2 thin films annealed with400°C for 2 hour and the morphology and structure of these films are describedby X-ray diffraction XRD and atomic force microscopy AFM to show the phasestructure. X-ray diffraction investigation uncovered that the crystalline size of theTiO2 thin films displays an expanding pattern with increasing the sputteringpower. The preferred orientation of (101) was watched for the films depositedwith sputtering power of (75,100,125 and 150) Watt

Listing 1 - 4 of 4
Sort by
Narrow your search

Resource type

article (4)


Language

English (4)


Year
From To Submit

2018 (3)

2016 (1)